The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 22, 2021

Filed:

Apr. 30, 2019
Applicant:

Taiwan Semiconductor Manufacturing Company, Ltd., Hsinchu, TW;

Inventors:

Hsin-Chang Lee, Zhubei, TW;

Chia-Jen Chen, Jhudong Township, TW;

Chih-Cheng Lin, Kaohsiung, TW;

Ping-Hsun Lin, Hsinchu, TW;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 1/44 (2012.01); G03F 1/84 (2012.01); G03F 1/42 (2012.01); G03F 1/54 (2012.01); G03F 1/72 (2012.01); G03F 1/76 (2012.01); G03F 7/20 (2006.01); G03F 1/22 (2012.01); G03F 1/78 (2012.01); H01L 21/027 (2006.01);
U.S. Cl.
CPC ...
G03F 1/44 (2013.01); G03F 1/42 (2013.01); G03F 1/84 (2013.01); G03F 1/22 (2013.01); G03F 1/54 (2013.01); G03F 1/72 (2013.01); G03F 1/76 (2013.01); G03F 1/78 (2013.01); G03F 7/2004 (2013.01); H01L 21/0274 (2013.01);
Abstract

A photomask includes a pattern region and a plurality of defects in the pattern region. The photomask further includes a first fiducial mark outside of the pattern region, wherein the first fiducial mark includes identifying information for the photomask, the first fiducial mark has a first size and a first shape. The photomask further includes a second fiducial mark outside of the pattern region. The second fiducial mark has a second size different from the first size, or a second shape different from the first shape.


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