The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 08, 2021

Filed:

Nov. 29, 2018
Applicant:

International Business Machines Corporation, Armonk, NY (US);

Inventors:

Mona A. Ebrish, Albany, NY (US);

Michael Rizzolo, Delmar, NY (US);

Son Nguyen, Schenectady, NY (US);

Raghuveer R. Patlolla, Guilderland, NY (US);

Donald F. Canaperi, Bridgewater, CT (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 27/088 (2006.01); H01L 21/3105 (2006.01); H01L 29/78 (2006.01); H01L 27/22 (2006.01); H01L 21/311 (2006.01);
U.S. Cl.
CPC ...
H01L 21/31053 (2013.01); H01L 21/31116 (2013.01); H01L 27/228 (2013.01); H01L 29/7851 (2013.01);
Abstract

A semiconductor device and method of formation thereof. The semiconductor device includes a portion of a first material that abuts a portion of a second material and surrounds at least a portion of a semiconductor component. The first material has a first composition and a first index of refraction and is of a same type of material as the second material. The second material has a second composition and a second index of refraction. An opening in the first material exposes a portion of the semiconductor component.


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