The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 25, 2021
Filed:
Jul. 13, 2018
Applicant:
Mks Instruments, Inc., Andover, MA (US);
Inventors:
Xing Chen, Lexington, MA (US);
Ilya Pokidov, North Reading, MA (US);
Atul Gupta, Lexington, MA (US);
Assignee:
MKS Instruments, Inc., Andover, MA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B23K 10/00 (2006.01); H05H 1/46 (2006.01); H05H 1/24 (2006.01); H01J 37/32 (2006.01);
U.S. Cl.
CPC ...
H05H 1/46 (2013.01); H01J 37/321 (2013.01); H01J 37/32357 (2013.01); H01J 37/32467 (2013.01); H01J 37/32522 (2013.01); H05H 1/2406 (2013.01);
Abstract
A plasma chamber of a plasma processing system is provided. The plasma chamber defines a plasma channel having a first side and a second side oppositely disposed along a length of the plasma channel. The plasma chamber comprises a first section and a second section constructed from a dielectric material and an interface that bonds together the first and second sections at between a first flange of the first section and a third flange of the second section and between a second flange of the first section and a fourth flange of the second section.