The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 25, 2021

Filed:

Jul. 26, 2017
Applicant:

Taiwan Semiconductor Manufacturing Company Ltd., Hsinchu, TW;

Inventors:

Yung-Yao Lee, Hsinchu County, TW;

Wei-Hsiang Tseng, Hsinchu County, TW;

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
B05D 3/12 (2006.01); H01L 21/67 (2006.01); B05B 3/10 (2006.01); G03F 7/16 (2006.01); B05D 1/00 (2006.01);
U.S. Cl.
CPC ...
B05B 3/1085 (2013.01); B05D 1/005 (2013.01); G03F 7/162 (2013.01); H01L 21/6715 (2013.01); H01L 21/67248 (2013.01); H01L 21/67253 (2013.01);
Abstract

Present disclosure provides a substrate processing apparatus, including a rotatable pedestal configured to hold a substrate, a driving mechanism connected to the rotatable pedestal, a liquid pouring nozzle over the pedestal, a temperature sensor configured to probe a temperature of the substrate processing apparatus, and a controller communicating with the temperature sensor and the driving mechanism. Present disclosure also provides a method for processing a substrate, including providing a substrate on a pedestal of a processing chamber, probing a temperature of the processing chamber, calculating a temperature difference between the temperature of the processing chamber and a predetermined temperature, and determining a rotational speed difference with respect to a predetermined rotational speed of the pedestal according to the temperature difference.


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