The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 18, 2021
Filed:
Aug. 16, 2019
Disco Corporation, Tokyo, JP;
Karl Heinz Priewasser, Munich, DE;
Kensuke Nagaoka, Munich, DE;
DISCO CORPORATION, Tokyo, JP;
Abstract
The invention relates to a method of processing a substrate. The substrate has one side and a side opposite to the one side. The substrate has, on the one side or on the side opposite to the one side, at least one recess. The method comprises providing a protective film and applying the protective film to the side of the substrate having the at least one recess so that at least a central area of a front surface of the protective film is in direct contact with the side of the substrate having the at least one recess. The method further comprises applying pressure to the protective film so that the protective film enters into the at least one recess along at least part of a depth of the recess, and processing the one side of the substrate and/or the side of the substrate opposite to the one side.