The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 18, 2021

Filed:

May. 23, 2019
Applicants:

Sciocs Company Limited, Ibaraki, JP;

Sumitomo Chemical Company, Limited, Tokyo, JP;

Inventors:

Hajime Fujikura, Ibaraki, JP;

Taichiro Konno, Ibaraki, JP;

Takayuki Suzuki, Ibaraki, JP;

Toshio Kitamura, Ibaraki, JP;

Tetsuji Fujimoto, Ibaraki, JP;

Takehiro Yoshida, Ibaraki, JP;

Assignees:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C30B 29/40 (2006.01); H01L 31/0304 (2006.01);
U.S. Cl.
CPC ...
C30B 29/403 (2013.01); H01L 31/03044 (2013.01);
Abstract

An object of the present invention is to improve quality of a group-III nitride crystal, and also improve performance and manufacturing yield of a semiconductor device manufactured using the crystal. Provided is a nitride crystal represented by the composition formula of InAlGaN (satisfying 0≤x≤1, 0≤y≤1, 0≤x+y≤1), with a hardness exceeding 22.0 GPa as measured by a nanoindentation method using an indenter with a maximum load applied thereto being within a range of 1 mN or more and 50 mN or less.


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