The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 18, 2021
Filed:
Dec. 20, 2018
Applicant:
Applied Materials, Inc., Santa Clara, CA (US);
Inventors:
Young J. Paik, Campbell, CA (US);
Ashish Bhatnagar, Fremont, CA (US);
Kadthala Ramaya Narendrnath, San Jose, CA (US);
Assignee:
Applied Materials, Inc., Santa Clara, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B24B 37/30 (2012.01); B24B 37/32 (2012.01); H01L 21/321 (2006.01);
U.S. Cl.
CPC ...
B24B 37/30 (2013.01); B24B 37/32 (2013.01); H01L 21/3212 (2013.01);
Abstract
An apparatus comprises a flexible membrane for use with a carrier head of a substrate chemical mechanical polishing apparatus. The membrane comprises an outer surface providing a substrate receiving surface, wherein the outer surface has a central portion and an edge portion surrounding the central portion, wherein the central portion has a first surface roughness and the edge portion has a second surface roughness, the first surface roughness being greater than the second surface roughness.