The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 11, 2021

Filed:

Nov. 26, 2019
Applicant:

Asml Netherlands B.v., Veldhoven, NL;

Inventors:

Venugopal Vellanki, San Jose, CA (US);

Vivek Kumar Jain, Milpitas, CA (US);

Stefan Hunsche, Santa Clara, CA (US);

Assignee:

ASML Netherlands B.V., Veldhoven, NL;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06F 30/398 (2020.01); G06N 20/00 (2019.01); G03F 7/00 (2006.01); G03F 1/60 (2012.01); G03F 1/84 (2012.01); G06F 30/20 (2020.01); G03F 7/20 (2006.01); G06F 119/18 (2020.01);
U.S. Cl.
CPC ...
G03F 7/7065 (2013.01); G03F 1/60 (2013.01); G03F 1/84 (2013.01); G03F 7/705 (2013.01); G03F 7/70525 (2013.01); G03F 7/70641 (2013.01); G03F 7/70666 (2013.01); G06F 30/398 (2020.01); G06N 20/00 (2019.01); G06F 30/20 (2020.01); G06F 2119/18 (2020.01);
Abstract

A defect prediction method for a device manufacturing process involving processing one or more patterns onto a substrate, the method including; determining values of one or more processing parameters under which the one or more patterns are processed; and determining or predicting, using the values of the one or more processing parameters, an existence, a probability of existence, a characteristic, and/or a combination selected from the foregoing, of a defect resulting from production of the one or more patterns with the device manufacturing process.


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