The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 11, 2021

Filed:

Oct. 31, 2017
Applicant:

Taiwan Semiconductor Manufacturing Co., Ltd., Hsinchu, TW;

Inventors:

Shih-Yen Chen, Hsinchu, TW;

Tzi-Yi Shieh, Hsinchu, TW;

Yuh-Sen Chang, Hsinchu County, TW;

Chung-Li Lee, Hsinchu County, TW;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B23K 37/04 (2006.01); H01L 21/00 (2006.01); H05K 3/00 (2006.01); H01L 23/00 (2006.01); B23K 1/00 (2006.01); B23K 3/08 (2006.01); H01L 21/67 (2006.01); H01L 21/687 (2006.01); H05K 3/34 (2006.01);
U.S. Cl.
CPC ...
B23K 37/04 (2013.01); B23K 1/0016 (2013.01); B23K 3/08 (2013.01); H01L 21/67109 (2013.01); H01L 21/67115 (2013.01); H01L 21/68742 (2013.01); H01L 24/11 (2013.01); H01L 24/742 (2013.01); H01L 24/95 (2013.01); H01L 2224/1181 (2013.01); H01L 2224/11849 (2013.01); H01L 2224/13101 (2013.01); H01L 2224/81191 (2013.01); H05K 3/0008 (2013.01); H05K 3/3494 (2013.01); H05K 2203/081 (2013.01); H05K 2203/087 (2013.01);
Abstract

A tool and a method of reflow are provided. In various embodiments, the tool includes a chamber unit, a wafer lifting system, a heater, and an exhausting unit. The wafer lifting system is disposed in the chamber unit. The heater is coupled to the chamber unit, and configured to heat the wafer. The exhausting unit coupled to the chamber unit, and configured to exhaust gas in the chamber unit. The wafer lifting system is configured to receive and move the wafer in the chamber unit, and to provide a vertical distance between the heater and the wafer in the chamber unit.


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