The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 27, 2021

Filed:

Sep. 21, 2018
Applicant:

Shin-etsu Chemical Co., Ltd., Tokyo, JP;

Inventors:

Shohei Tagami, Annaka, JP;

Michihiro Sugo, Takasaki, JP;

Hideto Kato, Takasaki, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/683 (2006.01); H01L 21/304 (2006.01); C09J 183/04 (2006.01); C09J 183/10 (2006.01); C09J 183/14 (2006.01); C08G 77/04 (2006.01); C08G 77/455 (2006.01); C08G 77/52 (2006.01); B32B 7/06 (2019.01); B32B 7/12 (2006.01);
U.S. Cl.
CPC ...
H01L 21/6836 (2013.01); C09J 183/04 (2013.01); C09J 183/10 (2013.01); C09J 183/14 (2013.01); H01L 21/304 (2013.01); H01L 21/6835 (2013.01); B32B 7/06 (2013.01); B32B 7/12 (2013.01); C08G 77/04 (2013.01); C08G 77/455 (2013.01); C08G 77/52 (2013.01); H01L 2221/6834 (2013.01); H01L 2221/68327 (2013.01); H01L 2221/68381 (2013.01); H01L 2221/68386 (2013.01);
Abstract

A wafer processing laminate comprising a support, a temporary adhesive material layer laminated on the support, and a wafer stacked on the temporary adhesive material layer, the wafer having a front surface on which a circuit is formed and a back surface to be processed, the temporary adhesive material layer comprising a first temporary adhesive layer composed of a thermoplastic resin layer (A) laminated on the front surface of the wafer and a second temporary adhesive layer composed of a thermosetting resin layer (B) laminated on the first temporary adhesive layer, the thermoplastic resin layer (A) being soluble in a cleaning liquid (D) after processing the wafer, the thermosetting resin layer (B) being insoluble in the cleaning liquid (D) after heat curing and capable of absorbing the cleaning liquid (D) such that the cleaning liquid (D) permeates into the layer (B). This wafer processing laminate allows a wide selection of materials, facilitates separation and collection of a processed wafer, meets requirements on various processes, and can increase productivity of thin wafers.


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