The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 20, 2021

Filed:

Sep. 23, 2020
Applicant:

Picosun Oy, Espoo, FI;

Inventors:

Juhana Kostamo, Espoo, FI;

Timo Vähä-Ojala, Espoo, FI;

Tom Blomberg, Espoo, FI;

Marko Pudas, Espoo, FI;

Assignee:

PICOSUN OY, Espoo, FI;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/32 (2006.01); C23C 16/455 (2006.01); C23C 16/515 (2006.01); C23C 16/44 (2006.01); H01L 39/24 (2006.01);
U.S. Cl.
CPC ...
C23C 16/45504 (2013.01); C23C 16/4412 (2013.01); C23C 16/45514 (2013.01); C23C 16/45536 (2013.01); C23C 16/45544 (2013.01); C23C 16/515 (2013.01); H01J 37/32431 (2013.01); H01L 39/2438 (2013.01);
Abstract

A thin-film deposition apparatus, related systems and methods are provided. The thin-film deposition apparatuscomprises a reaction chamberfor accommodating substratesarranged with their side faces adjacent to each other and a fluid distribution devicewith an expansion regioninto which precursor fluid(s) enter via a number of inlets, and a transition regionfor mixing said fluids. From the transition region, fluidic flow is directed into the reaction chamberto propagate between the substratesin a strictly laminar manner. By the invention, uniformity of precursor distribution on the substrates can be markedly improved.


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