The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 13, 2021

Filed:

Dec. 07, 2018
Applicant:

Mpi Corporation, Hsinchu County, TW;

Inventors:

Lin-Lin Chih, Hsinchu County, TW;

Chien-Hung Chen, Hsinchu County, TW;

Guan-Jhih Liou, Hsinchu County, TW;

Yu-Hsun Hsu, Hsinchu County, TW;

Assignee:

MPI CORPORATION, Hsinchu County, TW;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01R 31/28 (2006.01); H04N 5/232 (2006.01);
U.S. Cl.
CPC ...
G01R 31/2893 (2013.01); G01R 31/2887 (2013.01); G01R 31/2891 (2013.01); H04N 5/23299 (2018.08);
Abstract

A wafer inspection method was provided. A motorized chuck stage is controlled by a control rod to be displaced between an upper position and a lower position of an adjustment range along a Z-axis direction, to change a relative position of a wafer on the motorized chuck stage relative to a probe. The control rod is movable between an upper limit position and a lower limit position in a displacement range. The wafer inspection method includes: determining a position of the control rod in the displacement range based on a measurement signal; determining a moving direction and a moving distance of the control rod based on a change of the measurement signal; generating a control signal based on the moving distance of the control rod; and controlling, based on the control signal, the motorized chuck stage and a camera stage to be displaced the same distance.


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