The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 16, 2021
Filed:
Feb. 20, 2018
Applicant:
Asml Netherlands B.v., Veldhoven, NL;
Inventors:
Ya Luo, Saratoga, CA (US);
Yu Cao, Saratoga, CA (US);
Jen-Shiang Wang, Sunnyvale, CA (US);
Yen-Wen Lu, Saratoga, CA (US);
Assignee:
ASML Netherlands B.V., Veldhoven, NL;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/20 (2006.01); G06N 20/00 (2019.01); G06K 9/62 (2006.01); G06N 20/10 (2019.01);
U.S. Cl.
CPC ...
G03F 7/705 (2013.01); G03F 7/70125 (2013.01); G06K 9/6263 (2013.01); G06K 9/6269 (2013.01); G06N 20/00 (2019.01); G06N 20/10 (2019.01);
Abstract
Methods of determining, and using, a patterning process model that is a machine learning model. The process model is trained partially based on simulation or based on a non-machine learning model. The training data may include inputs obtained from a design layout, patterning process measurements, and image measurements.