The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 09, 2021

Filed:

Apr. 27, 2017
Applicant:

C. Uyemura & Co., Ltd., Osaka, JP;

Inventors:

Katsuhisa Tanabe, Osaka, JP;

Tatsushi Someya, Osaka, JP;

Naoshi Nishimura, Osaka, JP;

Tetsuya Sasamura, Osaka, JP;

Eriko Furuya, Osaka, JP;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C23C 18/44 (2006.01); C23C 18/16 (2006.01); C23C 18/18 (2006.01); C23C 18/54 (2006.01); H01L 21/288 (2006.01);
U.S. Cl.
CPC ...
C23C 18/44 (2013.01); C23C 18/1651 (2013.01); C23C 18/1831 (2013.01); C23C 18/54 (2013.01); H01L 21/288 (2013.01);
Abstract

A film formation method is provided with a catalyst film formation step for forming a catalyst film on the surface of a substrate by displacement reduction plating, an intermediate film formation step for forming a palladium plating film on the catalyst film, and a surface film formation step for forming a gold plating film on the palladium plating film.


Find Patent Forward Citations

Tanabe, Katsuhisa. (2021). Film formation method (U.S. Patent No. 10941493). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/10941493

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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