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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 10935704 B1

PDFFull Text
Date of Patent:
Mar. 02, 2021

Filed:

Jan. 05, 2017

Substrate for an euv-lithography mirror

Applicant:

Carl Zeiss Smt Gmbh, Oberkochen, DE;

Inventors:

Claudia Ekstein, Ellwangen, DE;

Holger Maltor, Aalen, DE;

Assignee:

CARL ZEISS SMT GMBH, Oberkochen, DE;

Attorney:

Edell, Shapiro & Finnan, LLC

Primary Examiner:

Ricky D Shafer

Int. Cl.
CPC ...
G02B 5/08 (2006.01); C22C 9/00 (2006.01); C22C 32/00 (2006.01); C22C 21/00 (2006.01); C22C 29/00 (2006.01); C22C 1/05 (2006.01); C22C 14/00 (2006.01); C22C 21/12 (2006.01); G21K 1/06 (2006.01);
U.S. Cl.
CPC ...
G02B 5/0891 (2013.01); C22C 1/05 (2013.01); C22C 1/051 (2013.01); C22C 9/00 (2013.01); C22C 14/00 (2013.01); C22C 21/00 (2013.01); C22C 21/12 (2013.01); C22C 29/00 (2013.01); C22C 32/0015 (2013.01); C22C 32/0047 (2013.01); C22C 32/0084 (2013.01); G21K 1/062 (2013.01); Y10T 428/31678 (2015.04);
Abstract

Substrates suitable for mirrors used at wavelengths in the EUV wavelength range have substrates () including a base body () made of a precipitation-hardened alloy, of an intermetallic phase of an alloy system, of a particulate composite or of an alloy having a composition which, in the phase diagram of the corresponding alloy system, lies in a region which is bounded by phase stability lines. Preferably, the base body () is made of a precipitation-hardened copper or aluminum alloy. A highly reflective layer () is preferably provided on a polishing layer () of the substrate () of the EUV mirror ().

Find Patent Forward Citations

Ekstein, Claudia. (2021). Substrate for an euv-lithography mirror (U.S. Patent No. 10935704). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/10935704

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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