The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 16, 2021

Filed:

Mar. 30, 2017
Applicant:

Applied Materials, Inc., Santa Clara, CA (US);

Inventors:

Mehdi Vaez-Iravani, Los Gatos, CA (US);

Todd Egan, Fremont, CA (US);

Samer Banna, San Jose, CA (US);

Kyle Tantiwong, Livermore, CA (US);

Assignee:

APPLIED MATERIALS, INC., Santa Clara, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06K 9/00 (2006.01); H01L 21/67 (2006.01); G01B 11/24 (2006.01); G01B 11/30 (2006.01); H01L 21/66 (2006.01); G01N 21/956 (2006.01); G06T 7/00 (2017.01);
U.S. Cl.
CPC ...
H01L 21/67288 (2013.01); G01B 11/24 (2013.01); G01B 11/306 (2013.01); G01N 21/956 (2013.01); G06T 7/001 (2013.01); H01L 22/12 (2013.01); G01N 2021/95615 (2013.01); G06T 2207/30148 (2013.01);
Abstract

Embodiments of the disclosure provide methods and system for inspecting and treating a substrate. In one embodiment, a method is provided including transmitting a first plurality of beams from a diffractive beam splitter to a first surface of a substrate to generate a reflection of a second plurality of beams, wherein the first plurality of beams are spaced apart from each other upon arriving at the first surface of the substrate; receiving the second plurality of beams on a recording surface of an optical device, wherein the second plurality of beams are spaced apart from each other upon arriving at the recording surface; measuring positional information of the second plurality of beams on the recording surface; comparing the positional information of the second plurality of beams to positional information stored in a memory; and storing a result of the comparison in the memory.


Find Patent Forward Citations

Vaez-Iravani, Mehdi. (2021). Metrology system for substrate deformation measurement (U.S. Patent No. 10923371). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/10923371

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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