The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 02, 2021
Filed:
Jul. 24, 2019
Applicant:
Tokyo Electron Limited, Tokyo, JP;
Inventors:
Peter Ventzek, Austin, TX (US);
Alok Ranjan, Austin, TX (US);
Mitsunori Ohata, Miyagi, JP;
Michael Hummel, Austin, TX (US);
Assignee:
TOKYO ELECTRON LIMITED, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/32 (2006.01); H01L 21/02 (2006.01); H01L 21/3213 (2006.01);
U.S. Cl.
CPC ...
H01J 37/32174 (2013.01); H01J 37/321 (2013.01); H01J 37/32091 (2013.01); H01J 37/32568 (2013.01); H01J 37/32605 (2013.01); H01L 21/0262 (2013.01); H01L 21/32136 (2013.01); H01J 2237/3321 (2013.01); H01J 2237/3341 (2013.01);
Abstract
In one embodiment, a plasma processing system includes a plasma processing chamber, a substrate holder disposed in the plasma processing chamber, a coil disposed over the plasma processing chamber, and a plurality of taps configured to contact the coil at an associated contact region. The plasma processing system is configured to sustain a plasma by selecting a subset of taps from the plurality of taps to apply a power source and a reference potential.