The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 02, 2021
Filed:
Sep. 30, 2019
Carl Zeiss Smt Gmbh, Oberkochen, DE;
CARL ZEISS SMT GMBH, Oberkochen, DE;
Abstract
A mirror, in particular for a microlithographic projection exposure apparatus, has an optical effective surface and includes a substrate (), a reflection layer system () for reflecting electromagnetic radiation impinging on the optical effective surface (), an electrode arrangement () composed of a first material having a first electrical conductivity, the electrode arrangement being provided on the substrate, and a mediator layer () composed of a second material having a second electrical conductivity. The ratio between the first electrical conductivity and the second electrical conductivity is at least 100. The mirror also includes at least one compensation layer () which at least partly compensates for the influence of a thermal expansion of the electrode arrangement () on the deformation of the optical effective surface ().