The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 02, 2021

Filed:

Sep. 25, 2017
Applicant:

Shanghai Micro Electronics Equipment (Group) Co., Ltd., Shanghai, CN;

Inventors:

Yuzhi Li, Shanghai, CN;

Bing Xu, Shanghai, CN;

Zhiyong Yang, Shanghai, CN;

Chang Zhou, Shanghai, CN;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01B 11/00 (2006.01); G03F 7/20 (2006.01); G01N 21/956 (2006.01); H01L 21/68 (2006.01);
U.S. Cl.
CPC ...
G01B 11/002 (2013.01); G01N 21/956 (2013.01); G03F 7/70616 (2013.01); G03F 7/70633 (2013.01); G03F 7/70775 (2013.01); H01L 21/682 (2013.01);
Abstract

An optical measurement device and method are disclosed. A position measurement device is provided with a device for measuring inclinations of an optical detection module () and a substrate carrier () which are measured during movement of the optical detection unit and the substrate carrier. Calculation and correction can be made according to the inclination data and with reference to displacements of the optical detection module () and the substrate carrier () and coordinates of their positions. During measurement for a certain point on the substrate, measured data related to the point is corrected by using the device and the method, which improves measurement precision, thus eliminating a large error caused in measurement for a large-sized substrate ().


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