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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 10903056 B1

PDFFull Text
Date of Patent:
Jan. 26, 2021

Filed:

May. 15, 2018

Plasma source for rotating susceptor

Applicant:

Applied Materials, Inc., Santa Clara, CA (US);

Inventors:

Kallol Bera, Fremont, CA (US);

Anantha K. Subramani, San Jose, CA (US);

John C. Forster, Mt. View, CA (US);

Philip A. Kraus, San Jose, CA (US);

Farzad Houshmand, Santa Clara, CA (US);

Hanhong Chen, Milpitas, CA (US);

Assignee:

Applied Materials, Inc., Santa Clara, CA (US);

Attorney:

Servilla Whitney LLC

Primary Examiner:

Renan Luque

Int. Cl.
CPC ...
H01J 37/32 (2006.01); H01L 21/687 (2006.01); C23C 16/50 (2006.01); C23C 16/455 (2006.01); C23C 16/509 (2006.01); C23C 16/458 (2006.01); C23C 16/44 (2006.01); H01L 21/02 (2006.01); H01L 21/67 (2006.01); C23C 16/34 (2006.01); C23C 16/40 (2006.01);
U.S. Cl.
CPC ...
H01J 37/32715 (2013.01); C23C 16/345 (2013.01); C23C 16/402 (2013.01); C23C 16/4412 (2013.01); C23C 16/4584 (2013.01); C23C 16/45519 (2013.01); C23C 16/45536 (2013.01); C23C 16/45544 (2013.01); C23C 16/45551 (2013.01); C23C 16/45578 (2013.01); C23C 16/50 (2013.01); C23C 16/509 (2013.01); H01J 37/3244 (2013.01); H01J 37/32091 (2013.01); H01J 37/32541 (2013.01); H01J 37/32559 (2013.01); H01J 37/32568 (2013.01); H01L 21/0228 (2013.01); H01L 21/02274 (2013.01); H01L 21/67017 (2013.01); H01L 21/68764 (2013.01); H01L 21/68771 (2013.01); H01J 2237/3321 (2013.01); H01J 2237/3323 (2013.01); H01L 21/0214 (2013.01); H01L 21/02126 (2013.01); H01L 21/02167 (2013.01);
Abstract

Plasma source assemblies comprising an RF hot electrode having a body and at least one return electrode spaced from the RF hot electrode to provide a gap in which a plasma can be formed. An RF feed is connected to the RF hot electrode at a distance from the inner peripheral end of the RF hot electrode that is less than or equal to about 25% of the length of the RF hot electrode.

Find Patent Forward Citations

Quick Actions:

Bera, Kallol. (2021). Plasma source for rotating susceptor (U.S. Patent No. 10903056). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/10903056

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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