The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 19, 2021
Filed:
Aug. 25, 2017
Applicant:
Kla-tencor Corporation, Milpitas, CA (US);
Inventors:
Assignee:
KLA-Tencor Corporation, Milpitas, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B29C 64/20 (2017.01); B29C 64/30 (2017.01); B29C 64/393 (2017.01); B29C 64/268 (2017.01); B29C 64/386 (2017.01); B33Y 10/00 (2015.01); B33Y 50/02 (2015.01); B33Y 30/00 (2015.01); B33Y 40/00 (2020.01); B29C 64/153 (2017.01); B22F 3/105 (2006.01); B22F 3/00 (2006.01); B29C 64/295 (2017.01); B29C 64/264 (2017.01); H04N 5/232 (2006.01); G02B 21/00 (2006.01); G02B 21/24 (2006.01); G02B 21/36 (2006.01); G03B 13/36 (2006.01); G03F 7/20 (2006.01);
U.S. Cl.
CPC ...
H04N 5/23212 (2013.01); G02B 21/0016 (2013.01); G02B 21/244 (2013.01); G02B 21/245 (2013.01); G02B 21/36 (2013.01); G03B 13/36 (2013.01); G03F 7/20 (2013.01); G03F 7/70641 (2013.01);
Abstract
Focusing methods and modules are provided for metrology tools and systems. Methods comprise capturing image(s) of at least two layers of a ROI in an imaging target, binning the captured image(s), deriving a focus shift from the binned captured image(s) by comparing the layers, and calculating a focus position from the derived focus shift. Disclosed methods are direct, may be carried out in parallel to a part of the overlay measurement process and provide fast and simple focus measurements that improve metrology performance.