The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 19, 2021
Filed:
Oct. 25, 2016
Entegris, Inc., Billerica, MA (US);
John M. Cleary, New Fairfield, CT (US);
Jose I. Arno, Brookfield, CT (US);
Bryan C. Hendrix, Danbury, CT (US);
Donn Naito, Marble Falls, TX (US);
Scott Battle, Cedar Park, TX (US);
John N. Gregg, Marble Falls, TX (US);
Michael J. Wodjenski, New Milford, CT (US);
Chongying Xu, New Milford, CT (US);
ENTEGRIS, INC., Billerica, MA (US);
Abstract
Apparatus and method for volatilizing a source reagent susceptible to particle generation or presence of particles in the corresponding source reagent vapor, in which such particle generation or presence is suppressed by structural or processing features of the vapor generation system. Such apparatus and method are applicable to liquid and solid source reagents, particularly solid source reagents such as metal halides, e.g., hafnium chloride. The source reagent in one specific implementation is constituted by a porous monolithic bulk form of the source reagent material. The apparatus and method of the invention are usefully employed to provide source reagent vapor for applications such as atomic layer deposition (ALD) and ion implantation.