The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 19, 2021
Filed:
Apr. 19, 2018
Applicant:
Dnf Co., Ltd, Daejeon, KR;
Inventors:
Sung Gi Kim, Daejeon, KR;
Se Jin Jang, Jeju-si, KR;
Byeong-il Yang, Daejeon, KR;
Joong Jin Park, Daejeon, KR;
Sang-Do Lee, Daejeon, KR;
Jeong Joo Park, Daejeon, KR;
Sam Dong Lee, Daejeon, KR;
Gun-Joo Park, Daejeon, KR;
Sang Ick Lee, Daejeon, KR;
Myong Woon Kim, Daejeon, KR;
Assignee:
DNF CO., LTD., Daejeon, KR;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C07F 7/02 (2006.01); C07F 7/10 (2006.01); H01L 21/02 (2006.01); C23C 16/455 (2006.01); C23C 16/24 (2006.01);
U.S. Cl.
CPC ...
C07F 7/10 (2013.01); C23C 16/24 (2013.01); C23C 16/45536 (2013.01); H01L 21/02208 (2013.01); H01L 21/02271 (2013.01); H01L 21/0228 (2013.01); H01L 21/02274 (2013.01);
Abstract
Provided are a novel disilylamine compound, a method for preparing same, and a composition for depositing a silicon-containing thin film including the same. A disilylamine compound of the present invention has excellent reactivity, is thermally stable, and has high volatility, and thus, is used as a silicon-containing precursor, thereby manufacturing a high-quality silicon-containing thin film.