The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 12, 2021
Filed:
Sep. 09, 2019
Entegris, Inc., Billerica, MA (US);
Joseph D. Sweeney, New Milford, CT (US);
Joseph R. Despres, Middletown, CT (US);
Ying Tang, Brookfield, CT (US);
Sharad N. Yedave, Danbury, CT (US);
Edward E. Jones, Woodbury, CT (US);
Oleg Byl, Southbury, CT (US);
ENTEGRIS, INC., Billerica, MA (US);
Abstract
An ion source apparatus for ion implantation is described, including an ion source chamber, and a consumable structure in or associated with the ion source chamber, in which the consumable structure includes a solid dopant source material susceptible to reaction with a reactive gas for release of dopant in gaseous form to the ion source chamber, wherein the solid dopant source material comprises gallium nitride, gallium oxide, either of which may be isotopically enriched with respect to a gallium isotope, or combinations thereof.