The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 05, 2021

Filed:

Sep. 19, 2019
Applicant:

Synopsys, Inc., Mountain View, CA (US);

Inventor:

De-Shiuan Chiou, Taipei, TW;

Assignee:

Synopsys, Inc., Mountain View, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06F 17/50 (2006.01); G06F 30/394 (2020.01); G06F 30/398 (2020.01); G06F 111/20 (2020.01); G06F 119/10 (2020.01);
U.S. Cl.
CPC ...
G06F 30/394 (2020.01); G06F 30/398 (2020.01); G06F 2111/20 (2020.01); G06F 2119/10 (2020.01);
Abstract

A physical verification tool for debugging ESD ground path resistance violations in ESD protection circuits. The ESD ground path is modeled and partitioned into component path structures (polygons) that are disposed in associated design layers. A total ESD ground path resistance is then calculated and compared with a maximum allowable resistance value defined by an ESD protection rule. When the ESD ground path is non-compliant, a resistance contribution ratio is determined for each polygon and/or for each layer, for example, by applying nodal analysis to the ESD ground path model. Resistance contribution ratios are then calculated for each polygon and/or for each layer, and most-problematic polygons and/or layers are identified by way of having the highest resistance contribution ratio values. A report (e.g., a table or graphical visualization) is then generated that prioritizes or emphasizes (e.g., by way of a bolder contrast or brighter color) the most-problematic layer and/or polygon.


Find Patent Forward Citations

Chiou, De-Shiuan. (2021). Fixing esd path resistance errors in circuit design layout (U.S. Patent No. 10885258). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/10885258

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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