The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 29, 2020
Filed:
Dec. 19, 2019
Mitutoyo Corporation, Kanagawa-ken, JP;
Robert Kamil Bryll, Bothell, WA (US);
Mitutoyo Corporation, Kanagawa-ken, JP;
Abstract
A metrology system is provided with a transparent workpiece surface mode, for which the system is configured to vary a focus position over a plurality of positions along a Z height direction proximate to a workpiece. An image stack is acquired, wherein each image of the image stack includes a first surface (e.g., an upper surface of the workpiece) that is transparent or semi-transparent and at least a second surface that is at least partially viewable through the first surface. A plurality of focus curves are determined based on the image stack (e.g., with pattern projection utilized for improved contrast), from which first, second, etc. local focus peaks may be determined from each focus curve that correspond to the first, second, etc. surfaces, respectively. An image is displayed (e.g., extended depth of field, 3D) including a selected surface and for which features of the selected/displayed surface may be measured.