The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 22, 2020
Filed:
Sep. 13, 2018
Applicant:
Shin-etsu Chemical Co., Ltd., Tokyo, JP;
Inventors:
Jun Hatakeyama, Joetsu, JP;
Masaki Ohashi, Joetsu, JP;
Masahiro Fukushima, Joetsu, JP;
Takayuki Fujiwara, Joetsu, JP;
Assignee:
SHIN-ETSU CHEMICAL CO., LTD., Tokyo, JP;
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/00 (2006.01); G03F 7/004 (2006.01); G03F 7/039 (2006.01); C08L 41/00 (2006.01); C08K 5/00 (2006.01); C08K 5/42 (2006.01); C08L 33/14 (2006.01); C09D 125/08 (2006.01); C09D 133/10 (2006.01); C08L 25/18 (2006.01); C08F 12/24 (2006.01); C08F 12/16 (2006.01);
U.S. Cl.
CPC ...
G03F 7/0045 (2013.01); C08K 5/0025 (2013.01); C08K 5/42 (2013.01); C08L 33/14 (2013.01); C08L 41/00 (2013.01); C09D 125/08 (2013.01); C09D 133/10 (2013.01); G03F 7/0395 (2013.01); G03F 7/0397 (2013.01); C08F 12/16 (2013.01); C08F 12/24 (2013.01); C08L 25/18 (2013.01); C08L 2312/00 (2013.01);
Abstract
A resist composition is provided comprising a base polymer containing an iodized polymer, and an acid generator containing a sulfonium salt and/or iodonium salt of iodized benzene ring-containing fluorosulfonic acid. When processed by lithography, the resist composition exhibits a high sensitivity, low LWR and improved CDU independent of whether it is of positive tone or negative tone.