The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 15, 2020
Filed:
Sep. 06, 2019
Applicant:
Kla Corporation, Milpitas, CA (US);
Inventors:
Assignee:
KLA Corp., Milpitas, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01N 21/95 (2006.01); G01N 21/956 (2006.01); G03F 1/86 (2012.01); G01N 21/33 (2006.01); G03F 1/22 (2012.01); G01N 23/2255 (2018.01); G03F 1/74 (2012.01); G01N 23/2251 (2018.01);
U.S. Cl.
CPC ...
G01N 21/956 (2013.01); G01N 21/33 (2013.01); G01N 23/2251 (2013.01); G01N 23/2255 (2013.01); G03F 1/22 (2013.01); G03F 1/74 (2013.01); G03F 1/86 (2013.01);
Abstract
Methods and systems for photomask defect dispositioning are provided. One method includes directing energy to a photomask and detecting energy from the photomask. The photomask is configured for use at one or more extreme ultraviolet wavelengths of light. The method also includes detecting defects on the photomask based on the detected energy. In addition, the method includes generating charged particle beam images of the photomask at locations of the detected defects. The method further includes dispositioning the detected defects based on the charged particle beam images generated for the detected defects.