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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 10861960 B1

PDFFull Text
Date of Patent:
Dec. 08, 2020

Filed:

Jul. 31, 2019

Finfet device and method

Applicant:

Taiwan Semiconductor Manufacturing Company, Ltd., Hsinchu, TW;

Inventors:

Chung-Shu Wu, Taoyuan, TW;

Ying-Ya Hsu, Hsinchu, TW;

Ching-Yu Pan, Kaohsiung, TW;

Hsiu-Hao Tsao, Taichung, TW;

An Chyi Wei, Hsinchu, TW;

Yuan-Hung Chiu, Taipei, TW;

Assignee:

Taiwan Semiconductor Manufacturing Company, Ltd., Hsinchu, TW;

Attorney:

Slater Matsil, LLP

Primary Examiner:

Robert G Bachner

Assistant Examiner:

Molly K Reida

Int. Cl.
CPC ...
H01L 29/78 (2006.01); H01L 21/8234 (2006.01); H01L 27/088 (2006.01); H01L 29/66 (2006.01); H01L 21/02 (2006.01);
U.S. Cl.
CPC ...
H01L 29/66818 (2013.01); H01L 21/02236 (2013.01); H01L 21/823431 (2013.01); H01L 27/0886 (2013.01); H01L 29/7853 (2013.01);
Abstract

A method includes forming a fin on a substrate, forming an insulating material over the fin, recessing the insulating material to form an isolation region surrounding the fin, wherein an upper portion of the fin protrudes above the isolation region, performing a trimming process to reduce a width of the upper portion of the fin, and forming a gate structure extending over the isolation region and the upper portion of the fin.

Find Patent Forward Citations

Wu, Chung-Shu. (2020). Finfet device and method (U.S. Patent No. 10861960). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/10861960

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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