The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 08, 2020
Filed:
May. 25, 2016
Applicant:
Asml Netherlands B.v., Veldhoven, NL;
Inventors:
Stefan Hunsche, Santa Clara, CA (US);
Rafael Aldana Laso, Mountain View, CA (US);
Vivek Kumar Jain, Fremont, CA (US);
Marinus Jochemsen, Veldhoven, NL;
Xinjian Zhou, Los Altos, CA (US);
Assignee:
ASML Netherlands B.V., Veldhoven, NL;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/20 (2006.01); G06T 3/00 (2006.01); G06T 7/00 (2017.01);
U.S. Cl.
CPC ...
G03F 7/7065 (2013.01); G06T 3/0068 (2013.01); G06T 7/001 (2013.01); G06T 2207/30148 (2013.01);
Abstract
A method of defect validation for a device manufacturing process, the method including: obtaining a first image of a pattern processed into an area on a substrate using the device manufacturing process under a first condition; obtaining a metrology image from the area; aligning the metrology image and the first image; and determining from the first image and the metrology image whether the area contains a defect, based on one or more classification criteria.