The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 08, 2020
Filed:
May. 19, 2017
Applied Materials, Inc., Santa Clara, CA (US);
Jingjing Liu, Milpitas, CA (US);
Zhong Qiang Hua, Saratoga, CA (US);
Adolph Miller Allen, Oakland, CA (US);
Michael W. Stowell, Loveland, CO (US);
Srinivas D. Nemani, Sunnyvale, CA (US);
Chentsau Ying, Cupertino, CA (US);
Bhargav Citla, Fremont, CA (US);
Viachslav Babayan, Sunnyvale, CA (US);
Andrej Halabica, San Jose, CA (US);
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
A deposited amorphous carbon film includes at least 95% carbon. A percentage of sp3 carbon-carbon bonds present in the amorphous carbon film exceeds 30%, and a hydrogen content of the amorphous carbon film is less than 5%. A process of depositing amorphous carbon on a workpiece includes positioning the workpiece within a process chamber and positioning a magnetron assembly adjacent to the process chamber. The magnetron assembly projects a magnetic field into the process chamber. The method further includes providing a carbon target such that the magnetic field extends through the carbon target toward the workpiece. The method further includes providing a source gas to the process chamber, and providing pulses of DC power to a plasma formed from the source gas within the process chamber. The pulses of DC power are supplied in pulses of 40 microseconds or less, that repeat at a frequency of at least 4 kHz.