The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 01, 2020
Filed:
Sep. 10, 2019
Toshiba Memory Corporation, Tokyo, JP;
Kazuyuki Hino, Kanagawa, JP;
Hiromitsu Mashita, Tokyo, JP;
Masahiro Miyairi, Kanagawa, JP;
Hiroshi Yoshimura, Kanagawa, JP;
Taiga Uno, Kanagawa, JP;
Sachiyo Ito, Kanagawa, JP;
Shinichirou Ooki, Kanagawa, JP;
Kenji Shiraishi, Kanagawa, JP;
Hirotaka Ichikawa, Kanagawa, JP;
Yuto Takeuchi, Kanagawa, JP;
TOSHIBA MEMORY CORPORATION, Tokyo, JP;
Abstract
According to one embodiment, a mask pattern correction system includes the following configuration. A stress analysis circuitry divides a layout of a circuit pattern formed using a design mask formed in accordance with mask design data into correction regions, and acquires a displacement amount from the regions. A correction value calculation circuitry calculates a displacement correction value from the displacement amount. A correction map generation circuitry generates a correction map based on a correction value difference of the displacement correction values. A mask position correction circuitry allocates the regions to a layout of the circuit pattern, performs displacement correction of a mask pattern on the design mask by the displacement correction values, and creates a correction mask based on the displacement correction.