The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 01, 2020
Filed:
Apr. 20, 2017
Applicant:
Asml Netherlands B.v., Veldhoven, NL;
Inventors:
Marinus Jochemsen, Veldhoven, NL;
Scott Anderson Middlebrooks, Duizel, NL;
Stefan Hunsche, Santa Clara, CA (US);
Te-Sheng Wang, San Jose, CA (US);
Assignee:
ASML Netherlands B.V., Veldhoven, NL;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/20 (2006.01);
U.S. Cl.
CPC ...
G03F 7/70616 (2013.01); G03F 7/70466 (2013.01); G03F 7/70491 (2013.01); G03F 7/70541 (2013.01); G03F 7/70633 (2013.01);
Abstract
A method including obtaining an image of a plurality of structures on a substrate, wherein each of the plurality of structures is formed onto the substrate by transferring a corresponding pattern of a design layout; obtaining, from the image, a displacement for each of the structures with respect to a reference point for that structure; and assigning each of the structures into one of a plurality of groups based on the displacement.