The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 10, 2020
Filed:
Feb. 15, 2019
International Business Machines Corporation, Armonk, NY (US);
Nicole Saulnier, Slingerlands, NY (US);
Indira Seshadri, Niskayuna, NY (US);
Lawrence A. Clevenger, Saratoga Springs, NY (US);
Leigh Anne H. Clevenger, Rhinebeck, NY (US);
Gauri Karve, Cohoes, NY (US);
Fee Li Lie, Albany, NY (US);
Isabel Cristina Chu, Melrose, NY (US);
Hosadurga Shobha, Niskayuna, NY (US);
Ekmini A. De Silva, Slingerlands, NY (US);
International Business Machines Corporation, Armonk, NY (US);
Abstract
Techniques to improve CD width and depth uniformity between features with different layout densities are provided. In one aspect, a method of forming a contact structure includes: patterning features in different regions of a dielectric at different layout densities whereby, due to etch loading effects, the features are patterned to different depths in the dielectric and have different bottom dimensions; depositing a sacrificial spacer into/lining the features whereby some of the features are pinched-off by the sacrificial spacer; opening up the sacrificial spacer at bottoms of one or more of the features that are not pinched-off by the sacrificial spacer; selectively extending the one or more features in the dielectric, such that the one or more features have a discontinuous taper with a stepped sidewall profile; removing the sacrificial spacer; and filling the features with a conductive material to form the contact structure. A contact structure is also provided.