The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 10, 2020
Filed:
Nov. 10, 2014
Applicant:
Tokyo Electron Limited, Tokyo, JP;
Inventor:
Ian J. Brown, Austin, TX (US);
Assignee:
Tokyo Electron Limited, Tokyo, JP;
Primary Examiner:
Int. Cl.
CPC ...
B08B 3/08 (2006.01); B08B 3/10 (2006.01); B08B 7/00 (2006.01); C11D 11/00 (2006.01); H01L 21/67 (2006.01);
U.S. Cl.
CPC ...
B08B 7/0057 (2013.01); B08B 3/08 (2013.01); C11D 11/0047 (2013.01); H01L 21/6715 (2013.01); H01L 21/67051 (2013.01); H01L 21/67115 (2013.01); B08B 3/10 (2013.01);
Abstract
Systems and methods for cleaning a substrate include a combined treatment of hydrogen peroxide and ultraviolet (UV) irradiation. Specific embodiments include the direct irradiation with 185/254 nm UV of a spinning substrate immersed under a liquid film of dilute hydrogen peroxide solution. Such a cleaning treatment can result in about a 100% improvement of TiN strip rate compared to processing with the same hydrogen peroxide solution without UV exposure. Such method can also be executed at room temperature and still provide improved cleaning efficiency.