The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 03, 2020
Filed:
Feb. 06, 2019
Applicant:
Hitachi, Ltd., Tokyo, JP;
Inventors:
Assignee:
HITACHI, LTD., Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/28 (2006.01); H01J 37/141 (2006.01); H01J 37/12 (2006.01);
U.S. Cl.
CPC ...
H01J 37/28 (2013.01); H01J 37/141 (2013.01); H01J 37/12 (2013.01); H01J 2237/1202 (2013.01);
Abstract
The present invention provides an electron beam device suitable for observing the bottom of a deep groove or a deep hole with a high degree of accuracy under a large current condition. The electron beam device has: an electron optical system having an irradiation optical system to irradiate an aperturewith an electron beamemitted from an electron sourceand a reduction projection optical system to project and form an aperture image of the aperture on a sample; and a control unitto control a projection magnification of the aperture image of the aperture projected and formed on the sample and an aperture angleof the electron beam emitted to the sample by the electron optical system.