The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 27, 2020

Filed:

Dec. 09, 2016
Applicant:

Infineon Technologies Ag, Neubiberg, DE;

Inventors:

Anton Mauder, Kolbermoor, DE;

Wolfgang Bergner, Klagenfurt, AT;

Jens Peter Konrath, Villach, AT;

Dethard Peters, Hoechstadt, DE;

Reinhold Schoerner, Grossenseebach, DE;

Assignee:

Infineon Technologies AG, Neubiberg, DE;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 29/06 (2006.01); H01L 29/78 (2006.01); H01L 27/07 (2006.01); H01L 21/82 (2006.01); H01L 29/739 (2006.01); H01L 29/808 (2006.01); H01L 29/872 (2006.01); H01L 29/16 (2006.01); H01L 27/06 (2006.01); H01L 29/861 (2006.01); H01L 29/40 (2006.01); H01L 29/10 (2006.01);
U.S. Cl.
CPC ...
H01L 29/0634 (2013.01); H01L 21/8213 (2013.01); H01L 27/0605 (2013.01); H01L 27/0629 (2013.01); H01L 27/0664 (2013.01); H01L 27/0727 (2013.01); H01L 29/7397 (2013.01); H01L 29/7803 (2013.01); H01L 29/7804 (2013.01); H01L 29/7806 (2013.01); H01L 29/7813 (2013.01); H01L 29/7827 (2013.01); H01L 29/8083 (2013.01); H01L 29/872 (2013.01); H01L 29/8725 (2013.01); H01L 29/0619 (2013.01); H01L 29/1095 (2013.01); H01L 29/1608 (2013.01); H01L 29/407 (2013.01); H01L 29/7395 (2013.01); H01L 29/8613 (2013.01);
Abstract

A semiconductor device includes a plurality of drift regions of a plurality of field effect transistor structures arranged in a semiconductor substrate. The plurality of drift regions has a first conductivity type. The semiconductor device further includes a plurality of compensation regions arranged in the semiconductor substrate. The plurality of compensation regions has a second conductivity type. Each drift region of the plurality of drift regions is arranged adjacent to at least one compensation region of the plurality of compensation regions. The semiconductor device further includes a Schottky diode structure or metal-insulation-semiconductor gated diode structure arranged at the semiconductor substrate.


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