The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 20, 2020

Filed:

May. 22, 2019
Applicant:

Micron Technology, Inc., Boise, ID (US);

Inventors:

Devesh Dadhich Shreeram, Boise, ID (US);

Sanket S. Kelkar, Boise, ID (US);

Gurpreet S. Lugani, Boise, ID (US);

Paul A. Paduano, Boise, ID (US);

Matthew N. Rocklein, Boise, ID (US);

Sanjeev Sapra, Boise, ID (US);

Christopher W. Petz, Boise, ID (US);

Assignee:

Micron Technology, Inc., Boise, ID (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 27/108 (2006.01); H01L 49/02 (2006.01);
U.S. Cl.
CPC ...
H01L 27/1087 (2013.01); H01L 27/10829 (2013.01); H01L 28/92 (2013.01);
Abstract

Methods, apparatuses, and systems related to shaping a storage node material are described. An example method includes forming a pillar with a pattern of materials. The method further includes depositing a storage node material on a side of the pillar. The method further includes etching sacrificial materials within the pillar. The method further includes etching the storage node material in a direction from the pillar into the storage node.


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