The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 13, 2020
Filed:
Aug. 13, 2019
Applied Materials, Inc., Santa Clara, CA (US);
Jinxin Fu, Fremont, CA (US);
Yifei Wang, Sunnyvale, CA (US);
Ian Matthew McMackin, Mountain View, CA (US);
Rutger Meyer Timmerman Thijssen, San Jose, CA (US);
Ludovic Godet, Sunnyvale, CA (US);
APPLIED MATERIALS, INC., Santa Clara, CA (US);
Abstract
Embodiments of the present disclosure relate to measurement systems and methods for diffracting light. The measurement system includes a stage, an optical arm, and one or more detector arms. The method of diffracting light includes a method of diffracting light is provided, including projecting light beams having wavelength λto a first zone of a first substrate at the fixed beam angle θand the maximum orientation angle ϕ, obtaining a displacement angle Δθ, determining a target maximum beam angle θ, wherein θ=θ+Δθ, and determining a test grating pitch Pby a modified grating pitch equation P=λ/(sin θ+sin θ). The measurement system and method allow for measurement of nonuniform properties of regions of an optical device, such as grating pitches and grating orientations.