The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 06, 2020

Filed:

Jun. 23, 2017
Applicant:

Mitsubishi Materials Corporation, Tokyo, JP;

Inventors:

Nobuyuki Terasaki, Saitama, JP;

Toyo Ohashi, Saitama, JP;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H05K 3/06 (2006.01); H05K 3/00 (2006.01); H01L 35/08 (2006.01); H01L 23/498 (2006.01); H01L 23/373 (2006.01); H01L 23/12 (2006.01); H05K 1/03 (2006.01); H05K 1/18 (2006.01); H01L 23/00 (2006.01);
U.S. Cl.
CPC ...
H05K 3/0017 (2013.01); H01L 23/12 (2013.01); H01L 23/3735 (2013.01); H01L 23/49866 (2013.01); H01L 35/08 (2013.01); H05K 1/0306 (2013.01); H05K 1/181 (2013.01); H05K 3/0055 (2013.01); H01L 24/29 (2013.01); H01L 24/32 (2013.01); H01L 24/83 (2013.01); H01L 2224/29111 (2013.01); H01L 2224/32225 (2013.01); H01L 2224/83447 (2013.01); H01L 2924/10253 (2013.01); H01L 2924/3512 (2013.01); H05K 2201/10219 (2013.01);
Abstract

The method for manufacturing an insulated circuit board of the present invention includes: a ceramic/aluminum-joining step of joining an aluminum material to a ceramic substrate and thereby, forming an aluminum layer; a titanium material-disposing step of disposing a titanium material on a surface of the aluminum layer or the aluminum material in a circuit pattern shape; a titanium layer-forming step of performing a heat treatment in a state where the titanium material is laminated on the surface of the aluminum layer or the aluminum material and thereby, forming the titanium layer; and an etching treatment step of etching the aluminum layer on which the titanium layer is formed, into the circuit pattern shape.


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