The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 06, 2020
Filed:
Apr. 04, 2017
Applicant:
Asml Netherlands B.v., Veldhoven, NL;
Inventors:
Duan-Fu Stephen Hsu, Fremont, CA (US);
Jingjing Liu, San Jose, CA (US);
Assignee:
ASML Netherlands B.V., Veldhoven, NL;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06F 30/398 (2020.01); G06F 30/20 (2020.01); G03F 1/36 (2012.01); G03F 7/20 (2006.01); G03F 1/00 (2012.01); G03F 1/70 (2012.01);
U.S. Cl.
CPC ...
G06F 30/398 (2020.01); G03F 1/16 (2013.01); G03F 1/36 (2013.01); G03F 1/70 (2013.01); G03F 7/70433 (2013.01); G03F 7/70441 (2013.01); G06F 30/20 (2020.01);
Abstract
A method including obtaining at least a clip of a design layout, and determining a representation of the clip on a patterning device, under a condition that a reduction ratio from the representation to the clip is anisotropic. A method including obtaining a relationship between a first geometric characteristic in a design layout or an image thereof, and a second geometric characteristic in a representation of the design layout on a patterning device, wherein the relationship is a function involving reduction ratios in two different directions.