The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 06, 2020

Filed:

Jun. 21, 2018
Applicant:

Globalfoundries Inc., Grand Cayman, KY;

Inventors:

Gregory A. Northrop, Ballston Spa, NY (US);

Lionel Riviere-Cazaux, Clifton Park, NY (US);

Lars Liebmann, Mechanicville, NY (US);

Kai Sun, Clifton Park, NY (US);

Norihito Nakamoto, Clifton Park, NY (US);

Assignee:

GLOBALFOUNDRIES INC., Grand Cayman, KY;

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
G06F 30/00 (2020.01); G06F 30/392 (2020.01); G03F 1/36 (2012.01); G06F 30/398 (2020.01); H01L 21/78 (2006.01); G06F 111/04 (2020.01); G06F 111/20 (2020.01);
U.S. Cl.
CPC ...
G06F 30/392 (2020.01); G03F 1/36 (2013.01); G06F 30/398 (2020.01); G06F 2111/04 (2020.01); G06F 2111/20 (2020.01); H01L 21/78 (2013.01);
Abstract

Original cell design rule violations with respect to a second wiring layer are identified, while conductors of the second wiring layer are in an original position. The conductors of the second wiring layer are offset into different offset positions, and then the process of identifying violations is repeated for each of the offset positions. With this, metrics are generated for the original cell for the original position and each of the offset positions. Then, the original cell or the pitch of the second wiring layer are altered to produce alterations. The processes of identifying violations, offsetting conductors in the second wiring layer, repeating the identification of violations for all offsets, and generating metrics are repeated for each of the alterations. The original cell or one of the alterations is then selected, based on which cell produces the lowest number of violations of the design rules.


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