The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 06, 2020
Filed:
Oct. 25, 2018
Asml Netherlands B.v., Veldhoven, NL;
Zili Zhou, Eindhoven, NL;
Gerbrand Van Der Zouw, Waalre, NL;
Nitesh Pandey, Eindhoven, NL;
Markus Gerardus Martinus Maria Van Kraaij, Eindhoven, NL;
Martinus Hubertus Maria Van Weert, 's-Hertogenbosch, NL;
Anagnostis Tsiatmas, Eindhoven, NL;
Sergey Tarabrin, Eindhoven, NL;
Hilko Dirk Bos, Utrecht, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
The disclosure relates to methods of determining a value of a parameter of interest of a patterning process, and of cleaning a signal containing information about the parameter of interest. In one arrangement, first and second detected representations of radiation are obtained. The radiation is provided by redirection of polarized incident radiation by a structure. The first and second detected representations are derived respectively from first and second polarization components of the redirected radiation. An asymmetry in the first detected representation comprises a contribution from the parameter of interest and a contribution from one or more other sources of asymmetry. An asymmetry in the second detected representation comprises a larger contribution from said one or more other sources of asymmetry relative to a contribution from the parameter of interest. A combination of the first and second detected representations is used to determine a value of the parameter of interest.