The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 29, 2020
Filed:
May. 24, 2019
International Business Machines Corporation, Armonk, NY (US);
Injo Ok, Loudonville, NY (US);
Balasubramanian Pranatharthiharan, Watervliet, NY (US);
Soon-Cheon Seo, Glenmont, NY (US);
Charan V. V. S. Surisetty, Clifton park, NY (US);
ELPIS TECHNOLOGIES INC., Ottawa, CA;
Abstract
The disclosure relates to a structure and methods of forming spacers for trench epitaxial structures. The method includes: forming a spacer material between source and drain regions of respective first-type gate structures and second-type gate structures; growing source and drain material about the first-type gate structures, confined within an area defined by the spacer material; and growing source and drain material about the second-type gate structures, confined within an area defined by the spacer material.