The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 29, 2020

Filed:

Jul. 30, 2018
Applicant:

The Regents of the University of Colorado, a Body Corporate, Denver, CO (US);

Inventors:

Steven McClellan George, Boulder, CO (US);

Nicholas Ray Johnson, Louisville, CO (US);

Jaime Willadean Dumont, Racine, WI (US);

Amy Elizabeth Marquardt, Chicago, IL (US);

Younghee Lee, Boulder, CO (US);

David Richard Zywotko, Boulder, CO (US);

Aziz Abdulagatov, Boulder, CO (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
C23F 4/00 (2006.01); H01L 21/465 (2006.01); H01L 21/311 (2006.01); H01L 21/306 (2006.01);
U.S. Cl.
CPC ...
C23F 4/00 (2013.01); H01L 21/30621 (2013.01); H01L 21/31116 (2013.01); H01L 21/31122 (2013.01); H01L 21/465 (2013.01);
Abstract

The invention includes a method of promoting atomic layer etching (ALE) of a surface. In certain embodiments, the method comprises sequential reactions with a metal precursor and a halogen-containing gas. In other embodiments, the etching rate is increased by removing residual species bound to and/or adsorbed onto the surface.


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