The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 22, 2020
Filed:
Feb. 15, 2018
Intel Corporation, Santa Clara, CA (US);
James Mathew, Boise, ID (US);
Yunjun Ho, Boise, ID (US);
Zhiqiang Xie, Meridian, ID (US);
Hyun Sik Kim, Boise, ID (US);
Intel Corporation, Santa Clara, CA (US);
Abstract
A disclosed example to modulate slit stress in a semiconductor substrate includes a first controller to, after obtaining a wafer stress measurement of the semiconductor substrate, control a first process to apply a first material to the semiconductor substrate based on the wafer stress measurement, the semiconductor substrate including a slit between adjacent stacked transistor layers, the first material coating walls of the slit to reduce a first width of the slit between the adjacent stacked transistor layers to a second width; and a second controller to control a second process to apply a second material to the semiconductor substrate, the second material to be deposited in the second width of the slit, the first material and the second material to form a solid structure in the slit between the adjacent stacked transistor layers.