The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 22, 2020
Filed:
May. 02, 2018
Applicant:
Applied Materials, Inc., Santa Clara, CA (US);
Inventors:
Abhijit Basu Mallick, Palo Alto, CA (US);
Pramit Manna, Sunnyvale, CA (US);
Yihong Chen, San Jose, CA (US);
Ziqing Duan, San Jose, CA (US);
Rui Cheng, Santa Clara, CA (US);
Shishi Jiang, Santa Clara, CA (US);
Assignee:
Applied Materials, Inc., Santa Clara, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/3065 (2006.01); H01L 21/3105 (2006.01); H01L 21/321 (2006.01); H01L 21/033 (2006.01); H01L 21/768 (2006.01); H01L 21/3215 (2006.01);
U.S. Cl.
CPC ...
H01L 21/0338 (2013.01); H01L 21/0332 (2013.01); H01L 21/0335 (2013.01); H01L 21/0337 (2013.01); H01L 21/76877 (2013.01); H01L 21/76889 (2013.01); H01L 21/3215 (2013.01);
Abstract
Methods of forming self-aligned patterns are described. A film material is deposited on a patterned film to fill and cover features formed by the patterned film. The film material is recessed to a level below the top of the patterned film. The recessed film is converted to a metal film by exposure to a metal precursor followed by volumetric expansion of the metal film.