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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 10781515 B1

PDFFull Text
Date of Patent:
Sep. 22, 2020

Filed:

Mar. 04, 2019

Film-forming method and film-forming apparatus

Applicant:

Tokyo Electron Limited, Tokyo, JP;

Inventors:

Kyungseok Ko, Gyeonggi-do, KR;

Hiromi Shima, Nirasaki, JP;

Eiji Kikama, Nirasaki, JP;

Keisuke Suzuki, Nirasaki, JP;

Assignee:

TOKYO ELECTRON LIMITED, Tokyo, JP;

Attorneys:

Nath, Goldberg & Meyer

Jerald L. Meyer

Primary Examiner:

Nikolay K Yushin

Int. Cl.
CPC ...
H01L 21/00 (2006.01); C23C 16/34 (2006.01); H01L 21/02 (2006.01); C23C 16/455 (2006.01); H01L 21/67 (2006.01);
U.S. Cl.
CPC ...
C23C 16/345 (2013.01); C23C 16/45525 (2013.01); H01L 21/0217 (2013.01); H01L 21/0228 (2013.01); H01L 21/02211 (2013.01); H01L 21/02329 (2013.01); H01L 21/67017 (2013.01); H01L 21/67109 (2013.01);
Abstract

There is provided a method of forming a predetermined film by alternately supplying a film-forming raw material gas and a reaction gas onto a workpiece by an atomic layer deposition (ALD), the method including: beginning an ALD-based film formation at a first temperature at which an adsorption of the film-forming raw material gas occurs; continuing the ALD-based film formation while increasing the first temperature; and completing the ALD-based film formation at a second temperature at which a decomposition of the film-forming raw material gas occurs.

Find Patent Forward Citations

Ko, Kyungseok. (2020). Film-forming method and film-forming apparatus (U.S. Patent No. 10781515). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/10781515

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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