The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 15, 2020

Filed:

Nov. 26, 2018
Applicant:

Nuflare Technology, Inc., Yokohama-shi, JP;

Inventors:

Nobutaka Kikuiri, Koganei, JP;

Atsushi Ando, Edogawa-ku, JP;

Assignee:

NuFlare Technology, Inc., Yokohama-shi, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/28 (2006.01); H01J 37/244 (2006.01); G01N 23/2251 (2018.01); H01J 37/20 (2006.01); H01J 37/04 (2006.01);
U.S. Cl.
CPC ...
H01J 37/28 (2013.01); H01J 37/244 (2013.01); G01N 23/2251 (2013.01); H01J 37/04 (2013.01); H01J 37/20 (2013.01); H01J 2237/0453 (2013.01); H01J 2237/2816 (2013.01); H01J 2237/2817 (2013.01); H01J 2237/3045 (2013.01);
Abstract

A multiple beam image acquisition apparatus includes a stage to mount thereon a target object, a beam forming mechanism to form multiple primary electron beams and a measurement primary electron beam, a primary electron optical system to collectively irradiate the target object surface with the multiple primary electron beams and the measurement primary electron beam, a secondary electron optical system to collectively guide multiple secondary electron beams generated because the target object is irradiated with the multiple primary electron beams, and a measurement secondary electron beam generated because the target object is irradiated with the measurement primary electron beam, a multi-detector to detect the multiple secondary electron beams collectively guided, a measurement mechanism to measure a position of the measurement secondary electron beam collectively guided, and a correction mechanism to correct a trajectory of the multiple secondary electron beams by using a measured position of the measurement secondary electron beam.


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