The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 15, 2020

Filed:

Apr. 15, 2019
Applicant:

I-shou University, Kaohsiung, TW;

Inventors:

Yu-Jung Huang, Kaohsiung, TW;

Chung-Long Pan, Kaohsiung, TW;

Mei-Hui Guo, Kaohsiung, TW;

Assignee:

I-SHOU UNIVERSITY, Kaohsiung, TW;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06F 30/398 (2020.01); G06F 11/263 (2006.01); G06F 11/22 (2006.01); G06N 20/00 (2019.01);
U.S. Cl.
CPC ...
G06F 30/398 (2020.01); G06F 11/2221 (2013.01); G06F 11/263 (2013.01); G06N 20/00 (2019.01);
Abstract

A defect detection method for a multilayer daisy chain structure, including: generating a plurality of physical models having a defect of at least one defect type based on the at least one defect type of a daisy chain structure; generating a group of training samples for each of the physical models; generating a classifier model by using a machine learning technique algorithm via scattering parameter values of a training set; measuring an error value by comparing scattering parameter values of a testing set with the classifier model, using the classifier model as a defect model of the defect type based on the error value, and determining that the multilayer daisy chain has a defect corresponding to the at least one defect type by comparing actual measurements of scattering parameter values.


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